Ultra-High Vacuum Atomic Force Microscopy

Ultra-High Vacuum Atomic Force Microscope

The device is intended for ultra-high vacuum research of surface properties by probe methods with ultra-high resolution, including in the field of ultra-low temperatures.

Key features and capabilities:

resolution of STM, AFM - atomic (on standard Si samples);

scanning range - XY - 3x3 microns, Z - 2 microns;

measurement of tunneling current - from 30 pA to 1 μA;

force measuring range - from 10 pN to 10 nN;

ion cleaning system - Ar and other gases;

sample cooling system - up to 50 K;

In situ deposition of films of refractory and low-melting metals (Au, Ag, Cu, Al, Ti, W, etc.).

Work published

Integrated membrane-free thermal flow sensor for silicon-on-glass microfluidics

The device has an accuracy at the level of world leaders - no worse than 5% in the range of 0-30 µl / min

SEM image taken at FMN Laboratory took 2nd place in the microimage competition

Defects obtained in the silicon etching process have become artistic

Work published

Evolutionary selection growth of silver films for low-loss nanophotonic devices

A new method of the e-beam evaporation has been demonstrated

Work published

Low-loss silicon nitride photonic ICs for near-infrared wavelength bandwidth

Unique technology by FMN Lab for nonlinear photonics and neural networks

Open Doors Day at FMN Lab

Команда центра приглашает студентов МГТУ им. Н.Э. Баумана на День открытых дверей

Work published

Deep multilevel wet etching of fused silica glass microstructures in BOE solution

New material in Scientific reports