FMN Laboratory has patented technologies for creating plasmon nanolasers with unique characteristics

The developed technology brought to a qualitatively new level the methods of deposition, lithography and plasma-chemical etching of precious metals – gold and silver. These materials are key for applications in plasmonics, although they have a large number of technological limitations and are especially capricious from the point of view of nanofabrication. The method proposed by FMN Laboratory allows overcoming with these difficulties caused by the physical properties of materials.

The team obtained patents for each stage of the technology: physical deposition of ultrathin metal films from the gas phase, fabrication of arrays of submicron holes in thin films, plasma-chemical etching of submicron metal structures.