The Bauman University will launch contract production of quantum processors
The goal is to meet the growing need in the Russian Federation for next generation supercomputers
Plasma-chemical etching in chlorine-containing gases
Equipped with inductively coupled plasma source, the plant creates a high plasma density and, as a result, a high flux density of active radicals and ions.
The installation provides the following etching processes (uniformity across the plate for all processes <± 5%):